Benchmarking Patent Drafting from Inventor-Style Disclosures

Lekang Jiang, Wenjun Sun, Stefan Goetz


Abstract
While recent large language models (LLMs) have achieved promising results on individual patent drafting tasks, they fundamentally fail to investigate the core challenge of real-world patent drafting: generating a complete and legally coherent patent application directly from early-stage invention materials. Prior work predominantly assumes later-stage, highly structured, or already legalistic inputs. However, real patenting workflows begin with informal, de-legalized disclosures authored by inventors. To bridge the gap, we introduce Dis2Pat, a disclosure-to-patent dataset that reflects realistic patenting workflows by requiring the generation of complete patent applications directly from inventor-style, de-legalized disclosures. Given the inherent difficulty of long-form, legally constrained patent drafting and the strong privacy requirements, we further propose a strong baseline named Patent-MAF. It is a multi-agent framework for locally deployable patent drafting. Benchmark results reveal that current LLMs exhibit limitations in patent drafting, while Patent-MAF provides a strong baseline that consistently outperforms evaluated open-source models and remains competitive with large closed-source models.
Anthology ID:
2026.emnlp-main.1311
Volume:
Proceedings of the 2026 Conference on Empirical Methods in Natural Language Processing
Month:
October
Year:
2026
Address:
Budapest, Hungary
Editors:
Hung-Yi Lee, Sunipa Dev, Jessy Li, Desmond Elliott
Venue:
EMNLP
SIG:
SIGDAT
Publisher:
Association for Computational Linguistics
Note:
Pages:
29840–29854
Language:
URL:
https://aclanthology.org/2026.emnlp-main.1311/
DOI:
Bibkey:
Cite (ACL):
Lekang Jiang, Wenjun Sun, and Stefan Goetz. 2026. Benchmarking Patent Drafting from Inventor-Style Disclosures. In Proceedings of the 2026 Conference on Empirical Methods in Natural Language Processing, pages 29840–29854, Budapest, Hungary. Association for Computational Linguistics.
Cite (Informal):
Benchmarking Patent Drafting from Inventor-Style Disclosures (Jiang et al., EMNLP 2026)
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PDF:
https://aclanthology.org/2026.emnlp-main.1311.pdf